HLM-40MRT Upright Metallographic Microscope

1. Product features
-HLM-40MRT provides customers with cost-effective solutions for metallographic analysis and industrial testing with excellent imaging performance and comfortable operating experience.
-Optimized LMPlan series of infinite distance and long working distance metallographic objective lens, improve the correction level of chromatic aberration, while adjusting the film system design, further improve the image resolution and color reducibility.
-Can provide bright field, oblique lighting, simple polarized light and other observation functions, bright field image high brightness, high resolution, positive color restoration;Oblique lighting can highlight the visual stereo relief effect.
-50X, 100X, 200X, 500X, 1000X(optional) (Standard 10X eyepiece)
-The observation cylinder with the best comfortable Angle (30°) can relieve the tension and fatigue of users in the long working condition and ensure the best observation state;There is scale on the observe cylinder to facilitate the user to adjust the best pupil distance range.
-The falling illuminator adopts LED Cora lighting system with field of view aperture, aperture aperture and oblique lighting device.Preset offset mirror, offset mirror and color filter slot.
-A single 5W LED warm white light (3000-3300K), compared with similar LED lighting, can minimize the visual fatigue of the observer.
-With excellent concentrating system, the numerical aperture is larger, the brightness is higher, and the transmittance of transmitted light is greatly improved.
-Field stop and aperture stop pull rod device, with adjustable center, can flexibly adjust the size of lighting range, effectively avoid the influence of stray light on the image.
-Polarizing mirror and polarizing mirror can realize simple polarizing observation, you can also choose different color filter according to your needs to obtain the ideal observation effect.
-The reflective frame can place samples up to 28mm, and the reflective frame can lower the loading platform 50mm by rotating the screw at the same position in the picture on the right, thus making the maximum sample height up to 78mm.
-Random limit device, can effectively prevent sample and objective contact, avoid damage.

2.Technical parameters